Chamber Studies of Photolysis and Hydroxyl Radical Reactions of Trifluoroiodomethane.
Abstract
Decay rate measurements were conducted in Teflon chambers for the photolysis and hydroxyl radical reactions of trifluoroiodomethane (CF3I). Photolysis studies were conducted outdoors, and results showed that photolysis of CF3I is dependent upon cloud cover. Half-lives for CF3I photolysis ranged from a few days to a few weeks. Hydroxyl radical rate studies were conducted by generating the hydroxyl radicals in Situ using standard techniques. CF3I decay was monitored using standard spectrometric techniques. Results of the hydroxyl studies were poor due to extensive detection interferences and side reactions, although results indicated that photolysis is a more significant degradation pathway for CF3I than the second-order reaction with hydroxyl.
Document Details
- Document Type
- Technical Report
- Publication Date
- Apr 30, 1996
- Accession Number
- ADA318474
Entities
People
- Floyd L. Wiseman
- J. R. Wells
- Stewart J. Markgraf
Organizations
- Armstrong Laboratory