Microcolumn Arrays for Nanolithography.

Abstract

This program is to explore a novel method, based on arrays of miniaturized electron beam columns operating in parallel (for lithography in the 100 nm and below linewidth regime). It requires no mask and can bse exteneded to the sub-25 nm linewidth regime. It offers the potential of a low cost, high throughput manufacturing process for the new generation of ultradense, ultrafast devices. The objective of the current program is to develop the base technologies for the electron beam microcolumn and the related lithographic processes to allow its feasibility for high throughput multi-beam lithography to be evaluated. This is a joint IBM Research/Cornell University project with IBM focusing on microcolumn development, pattern generation and simple array multi-beam operation, and Cornell on low voltage lithographic processes, aspects of advanced field emission studies, and novel column fabrication techniques. This report covers only the activities at IBM Research.

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Document Details

Document Type
Technical Report
Publication Date
Sep 15, 1993
Accession Number
ADA318506

Entities

People

  • T. H. Chang

Organizations

  • IBM Thomas J. Watson Research Center

Tags

Communities of Interest

  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Assembly
  • Construction
  • Electron Beam Lithography
  • Electron Beams
  • Electron Emission
  • Electron Microscopy
  • Fabrication
  • Fermi Levels
  • Field Emission
  • Manufacturing
  • Materials
  • Measurement
  • Microscopy
  • Optics
  • Scattering
  • Test And Evaluation
  • Three Dimensional

Fields of Study

  • Physics

Readers

  • Integrated Circuit Design and Technology.
  • Nanofabrication and Microfabrication.
  • Optical Physics and Photonics.

Technology Areas

  • Directed Energy
  • Microelectronics