Microcontamination Sensor for VLSI Semiconductor Manufacturing.
Abstract
Feasibility demonstration of a trace-level water vapor sensor has been performed in Phase 1. The sensor is critically needed in semiconductor industry, where trace concentrations of water in highly reactive gases used in Very Large Scale Integration (VLSI) manufacturing decrease significantly the yield of IC chips produced. The sensor described is based on optical spectroscopy in the middle infrared region, and uses a novel laser source, based on nonlinear frequency conversion. In Phase 1 we have demonstrated both the feasibility of producing such a source (diode laser-pumped, room-temperature operation), and the feasibility of its application for sensitive frequency-modulation spectroscopy of water vapor in the middle infrared region. The results achieved open up the potential to develop a novel optical microsensor capable of reaching the required ultra-high detection sensitivity in a package suitable for use in industrial environments.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jan 23, 1997
- Accession Number
- ADA321189
Entities
People
- Pajo Vujkovic-cvijin