Low Voltage Electron Beam Lithography.

Abstract

The properties of negative electron affinity (NEA) photocathodes have been evaluated as sources in electron beam instrumentation. This characterization has been accomplished in two stages. The first stage, carried out in modified night vision tubes, established that these cathodes have brightness of 1 x 10(exp 8) A/cu cm-Sr and energy spreads as low as 50meV. The second stage, still in progress, entailed the construction of a demountable UHV electron gun in order to demonstrate cathode lifetime and stability. Thus for, the cathode his routinely been operated at currents as high as 90nA with no significant delay in emission.

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Document Details

Document Type
Technical Report
Publication Date
Dec 17, 1996
Accession Number
ADA321501

Entities

People

  • Aaron Baum
  • James Schneider
  • Roger Fabian W. Pease

Organizations

  • Stanford University

Tags

DTIC Thesaurus Topics

  • Brightness
  • Cathodes
  • Construction
  • Electron Beam Lithography
  • Electron Beams
  • Electron Guns
  • Electrons
  • Emission
  • Instrumentation
  • Lithography
  • Low Voltage
  • Measuring Instruments
  • Night Vision
  • Photocathodes
  • Voltage

Fields of Study

  • Physics

Readers

  • Electronics Engineering
  • Pulsed Power and Plasma Physics.
  • Thin Film Deposition Science.

Technology Areas

  • Directed Energy
  • Directed Energy - Pulsed-Laser Deposition
  • Microelectronics