Atomic Layer Control of Thin Film Growth Using Binary Reaction Sequence Chemistry,
Abstract
Our research is focusing on the atomic layer control of thin film growth. Our goal is to deposit films with precise control of thickness and conformality on both flat and high aspect ratio structures. Atomic layer control of growth is crucial for many technologies that require nanoscale deposition techniques to fabricate ultrathin and conformal films with thicknesses from 10-100 A. Examples of these films are ultrathin gate oxides, high dielectric constant films, conformal transparent conducting layers and ultrathin diffusion barriers.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 01, 1997
- Accession Number
- ADA327210
Entities
People
- Steven M. George
Organizations
- University of Colorado Boulder