MBE Growth of GaInAsSb.
Abstract
Optimum growth conditions for high quality growth of GaAs, GaSb, InSb and GaInAsSb epilayers by Molecular Beam Epitaxy (MBE) on GaAs substrates and homoepitaxial growth of InSb have been determined. A new procedure for expeditious removal of oxide desorption from InSb has been found. InSb epilayers grown on InSb substrate after the above oxide desorption exhibited x-ray rocking curve with full width half maxima of 13 arc-sec, reproducibly. Efforts of our research have also been devoted to aspects of material characterization. Low temperature photoreflectance (PR) of Te- doped GaSb has been used to determine the transition energy of spin-orbit split component of the fundamental band gap. Temperature dependence of this transition energy has been determined. These are the first PR reports on GaSb. Theoretical calculations of a novel InAsSb/InT1Sb superlattice structure lattice-matched to InSb indicated a type I band alignment, with optical band gap in the long-wavelength region.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jul 23, 1997
- Accession Number
- ADA328229
Entities
People
- Shanthi N. Iyer
Organizations
- North Carolina Agricultural and Technical State University