Spectroscopic, Voltammetric, and Electrochemical Scanning Tunneling Microscopic Study of Underpotentially Deposited Cu Corrosion and Passivation with Self-Assembled Organomercaptan Monolayers.
Abstract
FTIR-external reflectance spectroscopy (FTIR-ERS), x-ray photoelectron spectroscopy (XPS), electrochemistry, and electrochemical scanning tunneling microscopy (ECSTM) were used to study the effect of thiol adsorbates on the oxidation of underpotentially deposited Cu on Au (Au/Cu-UPD) in HC1O(4)-containing electrolyte solutions. The morphology of the corroding Cu layer and its stripping potential are influenced by the presence of the thiol monolayers. Hexadecanethiol prevented corrosion of Cu-UPD up to potentials more than 1200 mV positive of its oxidation potential on unpassivated electrodes. 4-hydroxythiophenol and pentanethiol also shift the oxidation potential but to a lesser degree. These findings raise the possibility for new strategies to prevent corrosion using very thin, easily prepared composite films.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jul 31, 1997
- Accession Number
- ADA328459
Entities
People
- Francis P. Zamborini
- Joseph K. Campbell
- Richard M Crooks
Organizations
- Texas A&M University