A Facility for the Attribute-Based Vapor Phase Processing of Multilayers and Coatings
Abstract
An electron beam deposition system suitable for the intelligent processing of oxide films and coatings has been designed and constructed. The three major features include (1) a heated substrate with a rotating stage (2) magnetically rastered e-beam dual sources, (3) four sub-systems for measuring film properties either in situ or post situ. The latter include: (a) an infrared imaging system, (b) a beam curvature apparatus for stress measurement, (c) an atomic force microscope to quantify topography. The system is being applied to oxide films relevant to thermal barrier applications (notably ZrO2) as well as alumina, ytrria and other oxides suitable for oxidation protection. The deposited films are being subject to a measurement protocol that determines their residual strain state, their fracture toughness and their adhesion to alloy substrates.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 26, 1997
- Accession Number
- ADA330747
Entities
People
- Anthony G. Evans
Organizations
- Harvard College