Surface Chemistry in Electrochemical Atomic Layer Processing
Abstract
Atomic layer processing involves the formation and/or etching of materials an atomic layer at a time. Atomic layer epitaxy is the most obvious example, where a thin film of a material is formed an atomic layer at a time. That is, surface limited reactions are used to deposit individual atomic layers of the elements making up a compound. These reactions are used in a cycle, where each cycle results in the formation of a monolayer of the compound. The present studies were designed to investigate these surface limited reactions. To determine what the structures of the deposits were, and how that structure influenced subsequent deposition.
Document Details
- Document Type
- Technical Report
- Publication Date
- Oct 16, 1997
- Accession Number
- ADA331050
Entities
People
- John L. Stickney
Organizations
- University of Georgia