Electrochemical Atomic Layer Epitaxy
Abstract
This is a review of work performed in the P.I.'s laboratory concerning development of the method of electrochemical atomic layer epitaxy. It includes an introduction covering compound semiconductor electrodeposition, with a table containing about 400 references. It contains a chapter on thin layer electrochemical studies, which are frequently used to get an initial idea of the conditions that should be used in an automated deposition cycle. There is a section on the development of the automated flow deposition system, and the growth of thin films of CdTe. There is a section on the atomic level characterization of these films using surface analytical methods. There is a section on the inverse of electrochemical ALE, digital etching. In those studies atomic layers are removed one at a time. There is also a conclusions section describing here we feel these techniques are going.
Document Details
- Document Type
- Technical Report
- Publication Date
- Oct 16, 1997
- Accession Number
- ADA331054
Entities
People
- John L. Stickney
Organizations
- University of Georgia