Selected Energy Epitaxial Deposition and Low Energy Electron Microscopy of AlN, GaN and SiC Thin Films

Abstract

The kinematic conditions under which III-Nitrides films can be grown were determined using efficient local-orbital molecular-dynamics simulations. Reaction paths for the impact of ammonia molecules on the cation- and anion-terminated surfaces of GaN and AlN were also determined. In situ growth experiments of GaN on 6H-SiC(0001) substrates were conducted in the low-energy electron microscope (LEEM). Initial nucleation at the steps and subsequent growth across the terraces were observed. The LEED patterns indicated three-dimensional crystal growth with pronounced formation of facets. Such growth behavior occurred irrespective of the method of deposition. A seeded beam source chamber has been interfaced with a UHV deposition chamber. Films of A1N have been grown with this system. Smooth, homoepitaxial GaN films were grown using an effusive Ga source and an NH3-seeded supersonic molecular beam. A small Ga flux-substrate temperature window was found that allows for two-dimensional homoepitaxial growth under MBE-like conditions (TS=730 deg C, pb-2x10(exp -6) Torr). Mass-analyzed Ga(+),N2(+) and N(+) ions at approx. 20 eV with a small energy spread of tilde 1 eV at FWHM were produced via two Colutron units with deceleration lenses. Ion beams of N2(+) and N(+) were used to perform nitridation of Si(100) surfaces. Subsequent SIMS depth profiles indicated the presence of nitride layers on the Si(100) substrates. Codeposition of Ga and N on Si(111) and Si(100) substrates was conducted with the Ga(+) and N2(+) ion beams. SIMS depth profiles showed the presence of both Ga and N on the Si substrate surfaces suggesting the formation of a GaN layer. A second generation arc-heated jet source and an inexpensive corona discharge source were designed, fabricated and characterized. Preliminary optical spectra of theses sources were obtained and evaluated. An improved optical and elec

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Document Details

Document Type
Technical Report
Publication Date
Sep 01, 1997
Accession Number
ADA332413

Entities

People

  • H. Henry Lamb
  • I. S. T. Tsong
  • Robert F Davis

Organizations

  • North Carolina State University

Tags

Communities of Interest

  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Compound Semiconductors
  • Crystals
  • Diffraction
  • Electron Energy
  • Electron Microscopes
  • Electron Microscopy
  • Epitaxial Growth
  • Ion Beams
  • Materials
  • Materials Science
  • Microscopy
  • Molecular Dynamics
  • Silicon Carbide
  • Spectra
  • Three Dimensional
  • Two Dimensional
  • Wide Bandgap Semiconductors

Fields of Study

  • Materials science

Readers

  • Pulsed Power and Plasma Physics.
  • Semiconductor Device Technology
  • Thin Film Deposition Science.

Technology Areas

  • Hypersonics
  • Hypersonics - Hypersonic Flow
  • Microelectronics
  • Microelectronics - Graphene
  • Space
  • Space - Hall-Effect Thruster