Single Wafer Plasma Reactor Simulator

Abstract

The report contains information on ARPA ASSERT AFORSR #F49620-94-1-0167, Single wafer plasma reactor simulator. This information includes details of the objectives of the ASSERT project to optimize single wafer design and operation, and focuses on a protocol known as Programmed Rate Chemical Vapor Deposition. Justification for deviation from the original proposal, verification of time savings using this protocol, and transactions communicating and disseminating this protocol to interested parties are discussed. Sections in the report include Accomplishments/New Findings (e.g., the time savings verification), personnel supported, associated personnel, publications, transactions, and interactions explaining the work are also included, as well as future work to which this research could be applied.

Open PDF

Document Details

Document Type
Technical Report
Publication Date
Jul 25, 1997
Accession Number
ADA337684

Entities

People

  • John J. Kristof

Organizations

  • Arizona Board of Regents

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Algorithms
  • Chemical Reactions
  • Chemical Vapor Deposition
  • Chemistry
  • Coatings
  • Corporations
  • Electronic Materials
  • Films
  • Materials
  • Materials Processing
  • Semiconductor Manufacturing
  • Semiconductors
  • Simulations
  • Simulators
  • Technology Transfer
  • Thin Films
  • Vapor Deposition

Readers

  • Computational Modeling and Simulation
  • Semiconductor Device Technology
  • Technical Research and Report Writing.