Laser Induced Chemical Vapor Deposition of Thin Films

Abstract

This report results from a contract tasking Technion as follows: Investigate the characteristics of thin silicon nitride films deposited on substrates via the use of chemical laser deposition techniques. This report summarized the research activities during the first year of work as was planned in the proposal. It completes the information which was given in the previous two progress reports. Basically, the aim of the first year was to study the possibility of deposition of silicon nitride thin films from silane and ammonia at low temperatures. The investigation was carried out by studying the effect of substrate temperature on deposition rate and film quality. In addition, the photochemical reaction was studied by analyzing the composition of gas molecules prior and during laser irradiation. At the end of the first year it was also possible to start doing experiments for deposition of silicon carbide from silane and acetylene.

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Document Details

Document Type
Technical Report
Publication Date
Jan 01, 1995
Accession Number
ADA339034

Entities

People

  • Joseph Zahavi

Organizations

  • Technion – Israel Institute of Technology

Tags

DTIC Thesaurus Topics

  • Auger Electron Spectroscopy
  • Auger Electrons
  • Ceramic Materials
  • Chemical Vapor Deposition
  • Electron Spectroscopy
  • Films
  • Laser Beams
  • Low Temperature
  • Materials
  • Materials Processing
  • Measurement
  • Partial Pressure
  • Refractive Index
  • Silicon Carbide
  • Thin Films
  • Three Dimensional
  • Vapor Deposition

Readers

  • Technical Research and Report Writing.
  • Thin Film Deposition Science.

Technology Areas

  • Directed Energy
  • Directed Energy - Pulsed-Laser Deposition