Sub-Micron Lithography with the Atomic Force Microscope

Abstract

This was a year or progress where we consolidated our gains with parallel arrays of cantilevers, fabricating operating devices (pMOSFETs) using scanning probes as the lithography tool and for in-depth studies of the response of E-beam resist when exposed with electrons from the scanning tips. Our report is divided as follows: (1) High speed atomic force microcopy with parallel arrays of cantilevers; (2) Fabrication of pMOSFET's with SPL Lithography; and (3) Lithography with Hybrid AFM/STM Probes.

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Document Details

Document Type
Technical Report
Publication Date
Apr 08, 1998
Accession Number
ADA342660

Entities

People

  • Calvin F. Quate
  • Leland T. Edwards
  • Steve Minne

Organizations

  • Stanford University

Tags

Communities of Interest

  • Advanced Electronics
  • Sensors

DTIC Thesaurus Topics

  • Accuracy
  • Amplifiers
  • Closed Loop Systems
  • Computers
  • Control Systems
  • Electrical Engineering
  • Electronics
  • Electrons
  • Emission
  • Fabrication
  • Field Emission
  • Integrated Circuits
  • Lithography
  • Microscopes
  • Microscopy
  • Semiconductors
  • Two Dimensional

Readers

  • Nanoscale Plasmonic Nanotechnology

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene
  • Microelectronics - Microelectromechanical Systems