Alignment System for Anorad X-Ray Exposure Tool
Abstract
An X-ray exposure tool has been completed, based on a commercially available stage system. All of the individual functions, including mask and wafer loading, coarse and fine alignment, and exposure, have been demonstrated. The development of a user friendly software package to control the sequence of operations is continuing. In addition, an interferometer has been developed which performs absolute distance measurements with nanometer resolution. By switching between several optical fibers a single such interferometer may be used to make accurate measurements along a multiplicity of axes.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jan 15, 1998
- Accession Number
- ADA344528
Entities
People
- Martin Feldman
Organizations
- Louisiana State University