Analysis and Optimization of Oxidized Heterolayers

Abstract

The objective of this project is to develop a controlled oxidation process with minimized degradation of the adjacent device structures. A systematic study of the fundamental properties of the wet thermal oxides is being performed, including the dependence on oxide processing parameters, hydrogen and other dopant concentrations, oxidized layer thickness, and Ga concentration. The study was based on state-of-the-art structural analysis by transmission electron microscopy techniques, including structural microanalysis of the layers with respect to the phases formed and the presence of inhomogeneities.

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Document Details

Document Type
Technical Report
Publication Date
Jun 30, 1998
Accession Number
ADA348630

Entities

People

  • Eicke Weber

Organizations

  • University of California, Berkeley

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Electrical Engineering
  • Electron Microscopes
  • Electron Microscopy
  • Electronics Laboratories
  • Electrons
  • Engineering
  • Geometry
  • High Resolution
  • Lasers
  • Materials Science
  • Microscopy
  • Optoelectronics
  • Semiconductor Lasers
  • Semiconductors
  • Structural Analysis
  • Thickness
  • Transmission Electron Microscopy

Fields of Study

  • Materials science

Readers

  • Semiconductor Device Technology
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics