Electrophotographic Patterning for Large Area Electronics

Abstract

The goal of this program was to develop an electrophotographic patterning method for Thin-Film Transistors (TFTs) fabrication. The current Active-Matrix Liquid Crystals Display (AMLCD) fabrication method uses multi-step photolithographic masking, deposition, and etching. The objective of this effort was to explore processing alternatives that would eliminate the use of photolithographic equipment and thereby reduce the cost of fabricating TFTs for AMLCDs.

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Document Details

Document Type
Technical Report
Publication Date
May 01, 1998
Accession Number
ADA352566

Entities

People

  • Dashen Shen
  • Helena Gleskov
  • Sigurd Wagner

Organizations

  • University of Alabama in Huntsville

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Chemical Vapor Deposition
  • Computer Programs
  • Electrical Engineering
  • Electronic Mail
  • Electronics Industry
  • Electronics Laboratories
  • Energy Bands
  • Fabrication
  • Fermi Levels
  • Liquid Crystal Displays
  • Liquid Crystals
  • Modules (Electronics)
  • Semiconductors
  • Solar Cells
  • Solar Panels
  • Solid State Physics
  • Thin Film Transistors

Readers

  • Human-Computer Interaction (HCI).
  • Nanofabrication and Microfabrication.
  • Systems Analysis and Design

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene