New Approaches to Aluminum Passivation for Corrosion Prevention

Abstract

A new method for producing an aluminum oxide film on an aluminum surface has been discovered. This method involves the activation of adsorbed H2O molecules by the attachment of low energy electrons-producing OH radicals which are aggressive oxidizing agents. Al2 O3 film thickness of up to 25 A are easily achieved. Al2 O3 films made this way are excellent for corrosion passivation as measured electrochemically, and the artificially produced films exhibit a factor of 15-20 x higher impedance than thermally-grown Al2O3 films of the same thickness. In addition the stability of two aluminum corrosion inhibitor molecules on Al2O3 has been separately investigated using FTIR spectroscopy.

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Document Details

Document Type
Technical Report
Publication Date
Aug 31, 1998
Accession Number
ADA353996

Entities

People

  • John Yates

Organizations

  • University of Pittsburgh

Tags

Communities of Interest

  • Energy and Power Technologies
  • Materials and Manufacturing Processes

DTIC Thesaurus Topics

  • Aluminum
  • Aluminum Oxides
  • Chemical Reactions
  • Chemistry
  • Corrosion
  • Corrosion Inhibition
  • Decomposition
  • Electron Energy
  • Electrons
  • Impedance
  • Inhibitors
  • Oxide Films
  • Oxides
  • Spectra
  • Spectroscopy
  • Surface Chemistry
  • Surface Reactions

Fields of Study

  • Materials science

Readers

  • Molecular Photonics/Laser Physics
  • Surface Coatings Technology.
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene