Instrumentation to Enhance Optical Scatterometry for Semiconductor Metrology Development.

Abstract

This Equipment Grant enabled upgrades in our scatterometer research instrumentation and computational capability. This provided a unique capability to develop the metrology technique through performing collaborative investigations with SEMATECH, Texas Instruments, and IBM. These efforts demonstrated the potential of scatterometry to provide the semiconductor industry with a metrology tool for characterizing sub-0.1 m (and larger) features.

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Document Details

Document Type
Technical Report
Publication Date
Jan 01, 1998
Accession Number
ADA354189

Entities

People

  • J. R. Mcneil

Organizations

  • University of New Mexico

Tags

DTIC Thesaurus Topics

  • Accuracy
  • Angle Of Incidence
  • Detectors
  • Diffraction
  • Fabrication
  • Instrumentation
  • Laser Beams
  • Manufacturing
  • Materials
  • Measurement
  • Metrology
  • New Mexico
  • Refractive Index
  • Semiconductor Manufacturing
  • Semiconductors
  • Simulations
  • Statistical Analysis

Fields of Study

  • Physics

Readers

  • Defense Technology Research and Development.
  • Ocean-Atmosphere Mesoscale Modeling, Data Assimilation, and Flux Boundary Layers
  • Optical Physics and Photonics.

Technology Areas

  • Microelectronics