High Resolution Diagnostics for Pulse Shortening in HPM Sources

Abstract

The aim of the research conducted using the equipment acquired under this DURIP Grant is to develop the plasma deposition/implantation process for coating barium, strontium and calcium oxides on nickel substrates and to perform detailed surface analysis of the resultant materials as well as complete cathode lifetime and performance studies. Plasma deposition/implantation of the oxide layer directly on the cathode surface will eliminate the major sources of cathode poisoning.

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Document Details

Document Type
Technical Report
Publication Date
Jul 31, 1998
Accession Number
ADA355526

Entities

People

  • N. C. Luhmann Jr.

Organizations

  • University of California, Davis

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Chemistry
  • Current Density
  • Emission
  • High Resolution
  • Implantation
  • Linear Accelerators
  • Materials
  • Oxide Cathodes
  • Partial Pressure
  • Personal Computers
  • Poisoning
  • Substrates
  • Surface Analysis
  • Surfaces
  • Test Facilities
  • Water Vapor
  • Work Functions

Readers

  • Pulsed Power and Plasma Physics.
  • Research Science/Academic Research
  • Thin Film Deposition Science.