Heterostructures (CaSrBa)F2 on InP for Optoelectronics
Abstract
Temperature-reduced MBE growth of group II-a fluorides onto InP( 100) surface as well as optimal cleaning and passivation procedures for InP wafers have been newly developed taking into account exsisting literature data. High quality BaF2 and SrF2 layers onto InP(100) have been grown at 350 deg C under ultra-high vacuum conditions using epitaxial and bulk substrates. MBE and Laser Vacuum Epitaxy (LVE) growth methods for semiconductor-semiconductor (SS) and semiconductor-crystalline dielectric-semiconductor heterostructures are considered as well as experimental facilities for these processes are elaborated.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jan 01, 1995
- Accession Number
- ADA359538
Entities
People
- Sergei L. Pyshkin