High Density Arrays of Micromirrors.
Abstract
We have been exploring designs for high-spatial-density micromirror arrays (MMA's) for use in maskless lithography, pattern generation of photolithographic masks, and adaptive optics (AO) for imaging and laser-beam control. In particular, MMAs offer a potentially high-payoff application to maskless lithography. Lithography is the enabling technology for the $3OOB worldwide semiconductor electronics industry, which in turn has been the underpinning for U.S. dominance in military technology. Semiconductor lithography at its essence is a technique for accurately and cost-effectively transferring binary design information from the masks onto silicon wafers. In this process the mask is nothing more than the physical carrier of that binary design information. Over the past three decades semiconductor electronics has been well served by optical lithography, which has provided a fourfold increase in device performance every three years (Moore's Law"). Recently, however, the technical demands on optical lithography required to maintain this exponential pace of performance growth has pushed lithographic technology to its limits. In particular, mask technology - the science of fabricating, inspecting, repairing, and protecting the binary master-pattern masks used to synthesize advanced integrated circuits level by level - is fast becoming the Achilles heel of advanced lithography systems.
Document Details
- Document Type
- Technical Report
- Publication Date
- Feb 01, 1999
- Accession Number
- ADA362570
Entities
People
- Colin A. Lee
- J. A. Folta
- J. Kolman
- J. M. Brase
- J. Y. Decker
Organizations
- University of California