CVD Diamond Grown by Microwave Plasmas in Mixtures of Acetone/Oxygen and Acetone/Carbon Dioxide

Abstract

Diamond was deposited on silicon and molybdenum by microwave plasma enhanced chemical vapor deposition technique in acetone/oxygen and acetone/carbon dioxide mixtures. Diamond of good quality was deposited at rates exceeding 25 microns/hr. By the use of high-power-density microwave plasmas, diamond deposition using these two mixtures has been achieved at substrate temperatures up to 1300 deg C.

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Document Details

Document Type
Technical Report
Publication Date
Apr 30, 1999
Accession Number
ADA362752

Entities

People

  • Tsan-heui Chein
  • Yonhua Tzeng

Organizations

  • Auburn University

Tags

DTIC Thesaurus Topics

  • Carbon Dioxide
  • Carbon Monoxide
  • Chemical Vapor Deposition
  • Diagrams
  • Diamond Films
  • Dielectric Gases
  • Electrical Engineering
  • Films
  • Flow
  • Flow Rate
  • Gases
  • Materials
  • Materials Science
  • Microwaves
  • Raman Spectra
  • Substrates
  • Vapor Deposition

Readers

  • Materials Science and Engineering.
  • Plasma Physics.
  • Surface Engineering/Surface Coating Technology.