Silicon Intersubband Infrared Lasers
Abstract
In this document, we report on design of silicon-based intersubband lasers. There are: (1) The symmetric strain symmetrized Si/Ge intersubband laser, (2) The asymmetric design to obtain higher gain, (3) Studies and calculations of in-plane energy dispersion of Si/Ge superlattices needed for above designs. The p-i-p diode laser of, and (2) is grown up a relaxed Si (0.25) buffer layer on Si, with Ge quantum wells and Si barriers in a 3:1 thickness ratio.
Document Details
- Document Type
- Technical Report
- Publication Date
- Apr 01, 1999
- Accession Number
- ADA363439
Entities
People
- Lionel R. Friedman