DURIP: Request for Lithography and Metallization Equipment

Abstract

Electron beam lithography equipment, sputtering unit and missing components of an MOCVD system have been ordered. LEO-440 electron microscope was outfitted with Nabity Pattern Generation Systems software and associated hardware which allowed the microscope to be used in imaging and e-beam pattern generation modes. The instruments achieved 2 nm resolution in imaging mode and we are aiming at 50 nm in the writing mode. Necessary hardware components and operating software for a custom designed MOCVD system were ordered from EMCORE, received and integrated with the gas delivery system received from EMCORE and custom deposition reactor received from SVT Assoc. earlier. The system integration is nearly complete with some minor outstanding components from EMCORE. A sputtering system with one RF magnetron sputter gun and a pulsed magnetron sputter gun in an 18" chamber has been ordered from Kurt Lesker Company and is slated for delivery in a few months.

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Document Details

Document Type
Technical Report
Publication Date
May 20, 1999
Accession Number
ADA364236

Entities

People

  • Hadis H. Morkoç̌

Organizations

  • Virginia Commonwealth University

Tags

Communities of Interest

  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Air Force
  • Base Pressure
  • Chambers
  • Demographic Cohorts
  • Electron Beam Lithography
  • Electron Beams
  • Electron Microscopes
  • Electrons
  • Gases
  • Lithography
  • Magnetrons
  • Microscopes
  • Power Supplies
  • Refractory Metals
  • Scanning Electron Microscopes
  • Sputtering
  • Stainless Steel

Fields of Study

  • Physics

Readers

  • Nanofabrication and Microfabrication.
  • Software Engineering
  • Thin Film Deposition Science.

Technology Areas

  • Directed Energy
  • Directed Energy - Pulsed-Laser Deposition
  • Microelectronics
  • Microelectronics - Graphene
  • Microelectronics - Microelectromechanical Systems