Interfacial Bonding Research for Compliant Substrates.

Abstract

This is the second annual progress report. The goal of this project is the improvement of epitaxially grown lattice-mismatched III-V compound semiconductors by development of a practical compliant substrate technology. During the past focused on a GaAs compliant substrate approach using material fabricated by epitaxial growth of an AlAs/GaAs structure with the subsequent oxidation of the AlAs. Although we observed changes in surface morphology and a small reduction in x-ray rocking curve linewidths of layers grown on these substrates, we were unable to confirm any significant defect reduction. During the latter part of the year we shifted our focus back to twist-bonded approach.

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Document Details

Document Type
Technical Report
Publication Date
Jun 23, 1999
Accession Number
ADA364919

Entities

People

  • David L. Miller
  • Theresa S. Mayer

Organizations

  • Pennsylvania State University

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Aluminum Oxides
  • Chemical Compounds
  • Chemistry
  • Compound Semiconductors
  • Critical Temperature
  • Crystal Growth
  • Crystals
  • Engineering
  • Epitaxial Growth
  • Etching
  • Fabrication
  • Materials
  • Molecular Beam Epitaxy
  • Oxidation
  • Semiconductors
  • Substrates
  • Universities

Fields of Study

  • Materials science

Readers

  • Semiconductor Device Technology

Technology Areas

  • Microelectronics