Acquisition of a Scanning Electron Microscope for Electron Beam Lithography

Abstract

Equipment has been acquired for an Electron Beam Lithography (EBL) system. This system is based on a Leo 1550 SEM with a Raith beam blanker and Raith Elphy Quantum software. The system has been used for the fabrication of SET devices with 30nm dimensions as well as multi-layer superconductor circuits based on the niobium trilayer process.

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Document Details

Document Type
Technical Report
Publication Date
May 31, 1999
Accession Number
ADA364932

Entities

People

  • James Lukens

Organizations

  • Stony Brook University

Tags

Communities of Interest

  • Materials and Manufacturing Processes

DTIC Thesaurus Topics

  • Acquisition
  • Electron Beam Lithography
  • Electron Beams
  • Electron Microscopes
  • Electrons
  • Fabrication
  • Field Emission
  • High Resolution
  • Lithography
  • Lithography (Fabrication)
  • Microscopes
  • Optical Equipment
  • Optical Magnification Devices
  • Scanning
  • Scanning Electron Microscopes
  • Superconductors

Fields of Study

  • Physics

Readers

  • Nanofabrication and Microfabrication.
  • Nanoscale Plasmonic Nanotechnology
  • Superconducting Magnet Technology

Technology Areas

  • Directed Energy
  • Microelectronics
  • Microelectronics - Graphene
  • Microelectronics - Microelectromechanical Systems
  • Quantum Computing