DURIP 98-99: Molecular Beam Epitaxial Growth and In Situ Characterization of Phase Separated Optoelectronic Semiconductors
Abstract
This proposal requested funding to procure a Molecular Beam Epitaxy (MBE) chamber with extensive in situ diagnostic capabilities to study phase separation of III-V semiconductor alloys during epitaxial growth. An EPI930 Molecular Beam Epitaxy system was purchased from EPIMBE Products Group and installed in September of 1998, and is fully operational. This piece of equipment has facilitated several new research programs in the area of morphological and compositional evolution in III-V semiconductor thin films.
Document Details
- Document Type
- Technical Report
- Publication Date
- Feb 28, 1999
- Accession Number
- ADA368132
Entities
People
- Mirecki Millunchick
Organizations
- University of Michigan