Studies of Atomic Nitrogen in Low Pressure Discharges by Two-Photon Laser Induced Fluorescence.
Abstract
A series of diagnostic experiments have been compiled to investigate rf and microwave discharges in N2, such as those used for plasma processing of electronic materials. To develop a picture, as complete as possible, of the discharge chemistry, several reactive intermediates, e.g. N, N2(A), N2(B) and N2(C), were monitored. An alternative two-photon laser induced fluorescence (TALIF) scheme for detection of atomic nitrogen has been characterized and used to monitor and evaluate various atomic nitrogen sources. Photodissociation of N2O and subsequent detection of N atom photofragments by TALIF was also performed using the 207 nm laser pulse. From measurements within the pulsed rf discharge, a kinetic model was developed which predicted absolute concentrations of various discharge species. The behavior of several discharge species were also monitored in the N2 microwave discharge and compared to the model for the addition of small amounts of H2 and NH3. Atomic nitrogen destruction by surface and volume reaction was investigated by temporal N atom decay within a pulsed rf discharge. The volume loss rate of atomic nitrogen was also quantified to be substantially increased with the addition of as little as 0.1% O2 in an N2 rf discharge.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jul 01, 1999
- Accession Number
- ADA368763
Entities
People
- Steven Adams
Organizations
- Air Force Research Laboratory