Quantum Dot Array Formation through Biomolecular Nanopatterning. Phase 1
Abstract
ORT DEVELOPED UNDER SBIR contract for Topic A98-028: The objective is to demonstrate the feasibility of forming precisely ordered and precisely located arrays of semiconductor quantum dots by using biomolecular templates and Low Energy Electron Enhanced Etching (LE4) to define in a substrate an array of holes with diameters comparable to the size of quantum dots sought, and then growing one quantum dot in each nano-hole" by self-assembly of deposited adatoms. In Phase I, key methodology was developed: (1) depositing the biomolecular templates on clean (hydrophobic) Si(100) surfaces rather than on oxidized (hydrophilic)surfaces, in order to simplify the subsequent LE4 process; (2) identifying LE4 process conditions for etching the nano- pattern; (3) stripping the template-generated masks after LE4 by wet chemical method Deposition of GaAs by Molecular Beam Epitaxy (MBE) produced quantum dots randomly distributed over the surface, because the mask stripping process oxidizes the etched surface. In Phase I Option, methods for removing this oxide without destroying the etched nano-pattern will be demonstrated. These arrays have potential applications in optical emitters and detectors, single electron transistors, and high-density, memory arrays.
Document Details
- Document Type
- Technical Report
- Publication Date
- Oct 08, 1999
- Accession Number
- ADA369393
Entities
People
- H. P. Gillis