Semiconducting Diamond for Electronic Applications
Abstract
This research work aims at fabricating high-quality polycrystalline diamond thin films and at doping these films with Li/Na in order to obtain n-type semiconducting behavior. A hot filament chemical vapor deposition reactor is employed to deposit polycrystalline diamond films. We have successfully interfaced a spectroscopic ellipsometer to our chemical vapor deposition (CVD) system for the in situ monitoring of the diamond film deposition process. We have also interfaced our CVD to the emission. A study of the parameter space is underway in order to determine the optimum deposition window.
Document Details
- Document Type
- Technical Report
- Publication Date
- Apr 30, 1999
- Accession Number
- ADA369527
Entities
People
- Gerardo Morell
Organizations
- University of Puerto Rico