Multi-Spectral Imaging Ellipsometer for Fast, In-Situ Monitoring of Monolayer Film Deposition
Abstract
The goal of the Phase I project was to demonstrate the feasibility of mapping the thickness of amorphous layers in the monolayer thickness range using an imaging ellipsometer setup. The optical system has been established and tested, and the system's functionality was demonstrated both on commercial test substrates and on specifically fabricated test samples with patterned amorphous films. Even without the multi-spectral extension of the system, which will be added in Phase II of the project, extremely thin films were detected, measured, and mapped. The software for evaluating the film parameters from the optical measurement and for predicting the ellipsometer system behavior has been established and successfully tested. Thus all the necessary components are available for the realization of a prototype film processing monitor (with monolayer sensitivity) that can be operated in a coating chamber.
Document Details
- Document Type
- Technical Report
- Publication Date
- May 31, 1998
- Accession Number
- ADA370169
Entities
People
- Lothar Kempen