Optical Surface Analysis
Abstract
This report documents work that has centered around the continued development of a unique scatterometer and its transition to semiconductor materials characterization. A brief history of this lengthy project is contained in the Preface. Following an introduction in Section 1, Section 2 explains some background to this work and some of the motivations for pursuing it. Section 3 presents the work done to modernize and otherwise improve the scatterometer as it existed at the beginning of this work unit. Section 4 presents the work done to increase the capabilities of the scatterometer to include such things as multiple wavelength scattering, polarization control, 4" diameter sample capability, and improved alignment and automation features. Section 5 presents the design and initial testing of a scatterometer that has some distinct advantages over the current system. Section 6 presents initial work in approaching the problem of quantifying subsurface scatter. The remaining sections describe various important sub-tasks and miscellaneous items, concluding with a section on the direction in which future work will likely go as similar work continues under other work units.
Document Details
- Document Type
- Technical Report
- Publication Date
- Aug 01, 1996
- Accession Number
- ADA375788
Entities
People
- Jeff L. Brown