Theoretical Overview of the Large Area Plasma Processing System (LAPPS)
Abstract
A large area plasma processing system (LAPPS) is under development at NRL. In LAPPS, the plasma is generated by a sheet electron beam with voltages and current densities of the order of kilovolts and tens of milliamps per sq cm. The plasma dimensions are a meter square by a few centimeters thick. The beam is guided by a magnetic field of 50-300 Gauss. Since an electron beam of this type efficiently ionizes any gas, high electron densities, n approx. 10(exp 12) - 10(exp 13)/cu cm are easily are easily generated at 30-100 mTorr back ground pressure. In addition to large area and high electron density, LAPPS has advantages for plasma processing. These include independent control of ion and free radical fluxes to the surface, very high uniformity, very low electron temperature (Te < 1eV, but can be controllably increased to a desired value) and a geometry that is well suited for many applications. This paper sketches an initial theoretical overview of issues in LAPPS and compares aspects of the theory to a preliminary experiment.
Document Details
- Document Type
- Technical Report
- Publication Date
- Apr 17, 2000
- Accession Number
- ADA376399
Entities
People
- Mártin Lampe
- Richard Fernsler
- Robert Meger
- Wallace M. Manheimer
Organizations
- United States Naval Research Laboratory