Atomic Lithography: Forcing Epitaxial Growth Using X-Ray Standing Waves

Abstract

In a remarkably short time we have made tremendous progress in both the design and construction of a unique "atomic lithography" deposition facility, and in observing effects of an intense x-ray beam on the growth morphology of a thin semiconductor film. Now, with follow-on funding, we believe we are in a position to achieve the ambitious goals of this project. That is, to use a standing x-ray wave to template the growth of crystalline materials on amorphous substrates.

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Document Details

Document Type
Technical Report
Publication Date
Sep 01, 1999
Accession Number
ADA377868

Entities

People

  • Charles M. Falco
  • David J. Keavney
  • Gerd M. Fischer

Organizations

  • University of Arizona

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Electromagnetic Radiation
  • Electron Microscopy
  • Epitaxial Growth
  • Films
  • Geometry
  • Ionizing Radiation
  • Lithography
  • Materials
  • Momentum Transfer
  • Optics
  • Radiation
  • Standing Waves
  • Substrates
  • Surface Roughness
  • Thin Films
  • Waves
  • X Rays

Fields of Study

  • Physics

Readers

  • Atmospheric Science / Meteorology, specifically Wind Wave Turbulence.
  • Nanofabrication and Microfabrication.
  • Systems Analysis and Design

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene