Atomic-Scale Resolution Spectroscopy Applied to Thin-Film Characterization

Abstract

The objective of this program was to integrate atomic-resolution analytical techniques with more conventional methods of elemental, chemical, structural, and morphological characterization of surfaces, interfaces, and thin films in order to develop an ultimately better understanding of materials properties than could be obtained from each class of techniques by themselves. The emphasis was to develop methods for characterizing film growth, principally by chemical vapor deposition and sputter deposition. Applications are in electronic and magnetic thin films and nanostructures. The grant was primarily for the development of facilities. These include structural probes, optical probes, and scanned probes, and probes of interface magnetic properties.

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Document Details

Document Type
Technical Report
Publication Date
Oct 01, 1999
Accession Number
ADA380042

Entities

People

  • Max G. Lagally

Organizations

  • University of Wisconsin–Madison

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Carbon Nanotubes
  • Chemical Vapor Deposition
  • Chemistry
  • Crystals
  • Diffraction
  • Diffractometers
  • Electron Microscopy
  • Epitaxial Growth
  • Materials
  • Materials Processing
  • Materials Science
  • Measurement
  • Scattering
  • Semiconductors
  • Spectroscopy
  • Thin Films
  • Vapor Deposition

Fields of Study

  • Chemistry

Readers

  • Nanoscale Plasmonic Nanotechnology
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene