Solubility and Diffusion of Oxygen in Tantalum

Abstract

The solubility of oxygen in tantalum between 600 and 9OOC was determined to be log(ppm 0) =4.130- 1279/TK using a resistivity technique. Carefully reproduced pulses of oxygen were admitted to a high vacuum quartz tube furnace containing a tantalum wire. During each pulse, oxygen was maintained in contact with the specimen for a standard reproduced time after which the oxygen was pumped out and the resistance measured. A plot of change in resistance from the starting value versus number of oxygen charges resulted in a linear curve followed by one or more parabolic curves. The end of the linear section was interpreted to be the phase boundary. Specimens were analyzed by neutron activation to relate change in resistance to oxygen content.

Open PDF

Document Details

Document Type
Technical Report
Publication Date
Feb 01, 1969
Accession Number
ADA382682

Entities

People

  • D. Brayton
  • L. Reed
  • M. Parkman
  • Rick McRae
  • Robert A. Pape

Tags

Communities of Interest

  • Advanced Electronics
  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Accuracy
  • Base Pressure
  • Chemical Composition
  • Coefficients
  • Control Systems
  • Diffusion Coefficient
  • Electrical Resistance
  • Equations
  • Geometry
  • High Vacuum
  • Materials
  • Measurement
  • Refractory Metals
  • Resistance
  • Standards
  • Temperature Gradients
  • Vacuum Furnaces

Fields of Study

  • Materials science

Readers

  • Materials Science and Engineering.
  • Mechanical Engineering/Mechanics of Materials.
  • Thin Film Deposition Science.