Fundamentals of the Oxidation Protection of Columbium and Tantalum

Abstract

An investigation of the fundamental processes involved in the protection of tantalum and columbium by their silicides is in progress. The program has three parts. The first part is devoted to establishing thermochemical data for the silicides and employs an entirely solid state electrochemical cell. The second part deals with the protection of both coating and substrate by the protective glass formed during oxidation. Under certain conditions of temperature and pressure this glass does not form and the coating fails. The study of glass structure and growth is aimed at understanding the causes of failure and providing a rational basis for improving coatings. Lastly, since coating life may be limited by the formation of intermediate phases between the silicide and the substrate, these interactions are being investigated in the program along with the efficacy of diffusion barriers to retard intermediate phase growth.

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Document Details

Document Type
Technical Report
Publication Date
Oct 01, 1968
Accession Number
ADA382832

Entities

People

  • M. Kolodney
  • R. A. Graff

Organizations

  • City College of New York

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Diffraction
  • Electrodes
  • Energy
  • Films
  • Free Energy
  • Heat Of Formation
  • Infrared Spectra
  • Materials
  • Measurement
  • New York
  • Oxide Films
  • Oxides
  • Phase
  • Spectra
  • Spectroscopy
  • X Rays
  • X-Ray Diffraction

Readers

  • Systems Analysis and Design
  • Thin Film Deposition Science.