(DURIP 98/99) Real-Time Control for Advanced Material Processing Applications

Abstract

Improving materials processing capabilities is of fundamental importance to enable DOD and the Air Force to meet their future materials requirements for advanced applications. However, processing problems are increasingly more difficult as we seek to manufacture new materials with greater control over material microstructure, meet more stringent performance requirements while significantly reducing cost and time to market. To meet these challenges, we have been developing a controls based approach utilizing real-time sensors. The DURIP grant provided funds to implement three advanced materials process control applications: crystal growth for advanced opto-electronic semiconductors for high-bandwidth communications and detection, plasma deposition for protective coatings critical for engines, turbines, and space propulsion systems, and CVD, an enabling technology for many critical applications in aerospace, engines, manufacturing, and micro and opto-electronics. An overview of the equipment acquired and research results is provided.

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Document Details

Document Type
Technical Report
Publication Date
Jul 07, 2000
Accession Number
ADA382931

Entities

People

  • Donald Wroblewski
  • Michael Gevelber
  • Soumendra Basu

Organizations

  • Boston University

Tags

Communities of Interest

  • Advanced Electronics
  • Biomedical
  • Space
  • Weapons Technologies

DTIC Thesaurus Topics

  • Advanced Materials
  • Air Force
  • Chemical Vapor Deposition
  • Closed Loop Systems
  • Coatings
  • Compound Semiconductors
  • Control Systems
  • Crystal Growth
  • Detectors
  • Engineering
  • Engineers
  • Manufacturing
  • Materials
  • Materials Processing
  • Materials Science
  • Propulsion Systems
  • Semiconductors

Readers

  • Integrated Circuit Design and Technology.
  • Technical Research and Report Writing.
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Space