Modeling and Control of Advanced CVD Processes by PRS
Abstract
As part of an existing DoD-MURI Center research is being conducted in the field of real time optical process monitoring and control involving a close collaboration between Physicists) Materials Scientists, Chemical Engineers and Mathematicians. In this effort students address specifically closed-loop control of pulsed chemical beam epitaxy (PCBE) of compound semiconductors utilizing a multiple set of optical sensor inputs. These real time techniques are in development under the existing DoD MURI funding, F49620-95-1-0447, entitled "Modeling and Control of Advanced Chemical Vapor Deposition Processes: the Control of Defects in Mixed III-V Compound Heterostructures," of which Prof. Dietz and Prof. Ito are Co-Investigators. These students have worked with Profs. Dietz and Ito on the acquisition of experimental input data for the real-time modeling of PCBE processes and on the development and implementation of control theory algorithms.
Document Details
- Document Type
- Technical Report
- Publication Date
- Apr 30, 2000
- Accession Number
- ADA382934
Entities
People
- H. Thomas Banks
Organizations
- North Carolina State University