Modeling Validation and Control of Advanced Chemical Vapor Deposition Processes

Abstract

AASERT supported work on the following: Modeling of multiple layer stacks in thin film growth; Modeling of energy input terms in electromagnetic excitation of materials; PRS monitoring of multiple layer stacks in thin film growth; construction and testing of a prototype high pressure organometallic chemical vapor deposition (HPOMCVD) reactor; Reduced order surface kinetic models for GaP growth; computational methods for feedback control in nonlinear systems.

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Document Details

Document Type
Technical Report
Publication Date
Nov 08, 2000
Accession Number
ADA384359

Entities

People

  • H. Thomas Banks

Organizations

  • North Carolina State University

Tags

Communities of Interest

  • Advanced Electronics
  • Human Systems

DTIC Thesaurus Topics

  • Applied Mathematics
  • Chemical Vapor Deposition
  • Computational Science
  • Construction
  • Differential Equations
  • Epitaxial Growth
  • Equations
  • Films
  • High Pressure
  • Materials
  • Materials Science
  • Models
  • Nonlinear Systems
  • Students
  • Surface Reactions
  • Thin Films
  • Vapor Deposition

Readers

  • Robotics and Automation.
  • Thin Film Deposition Science.