Equipment for Multivariate Control, Simulation, Optimization, and Signal Processing for the Microlithographic Process

Abstract

This report summarizes the results associated with instrumentation purchased under DURIP contract F49620-98-1-0263 in support of AFOSR/DARPA MURI Program on 'Multivariable Control, Simulation, Optimization, and Signal Processing for the Microlithographic Process'. This project is generally concerned with the application of systems techniques to the lithographic sequence used for patterning integrated circuits at very small dimensions (less than 250 nanometers). This complex sequence is comprised of photoresist processing, mask design, and optical illumination steps. Lithography is a major technological area that may impede the continued increase in integrated circuit density (Moore's Law).

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Document Details

Document Type
Technical Report
Publication Date
Oct 01, 2000
Accession Number
ADA385337

Entities

People

  • Thomas Kailath

Organizations

  • Stanford University

Tags

Communities of Interest

  • Advanced Electronics
  • Air Platforms
  • Materials and Manufacturing Processes

DTIC Thesaurus Topics

  • Air Force
  • Circuits
  • Control Systems
  • Data Acquisition
  • Electrical Engineering
  • Electronics
  • Engineering
  • Fabrication
  • Illumination
  • Integrated Circuits
  • Lithography
  • Manufacturing
  • Optimization
  • Sequences
  • Signal Processing
  • Simulations
  • Temperature Control

Readers

  • Computational Fluid Dynamics (CFD)
  • Integrated Circuit Design and Technology.
  • Theoretical Analysis.