Modeling and Control of Advanced Chemical Vapor Deposition Processes: The Control of Defects in Mixed III-V Compound Heterstructures

Abstract

We report progress on the construction and testing of two high pressure organometallic chemical vapor deposition (HPOMCVD) reactors, real time feedback control of pulsed chemical beam epitaxy, reduced order model feedback control design, defect formation in heteroepitaxial growth of films, and remote plasma processing.

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Document Details

Document Type
Technical Report
Publication Date
Sep 01, 2000
Accession Number
ADA388201

Entities

People

  • H. Thomas Banks

Organizations

  • North Carolina State University

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Chemical Vapor Deposition
  • Chemistry
  • Computational Fluid Dynamics
  • Differential Equations
  • Electronics Industry
  • Electronics Laboratories
  • Epitaxial Growth
  • Fluid Flow
  • Materials
  • Materials Processing
  • Materials Science
  • Modules (Electronics)
  • Power Electronics
  • Semiconductor Devices
  • Semiconductors
  • Silicon Carbide
  • Vapor Deposition

Fields of Study

  • Materials science

Readers

  • Control Systems Engineering.
  • Software Engineering
  • Thin Film Deposition Science.