Instrumentation for Real-Time Information Extraction from RHEED and Correlation Using Scanning Probe Microscopy: Applications to Si-Nano-Electronics
Abstract
This project involved the procurement and installation of enhancements to Michigan Technological University's Molecular Beam Epitaxy (MBE) facility. MBE is a thin film deposition technique that permits precise control of multiple element fluxes to a surface, permitting alloy layers as thin as one monolayer to be prepared under carefully controlled conditions of vacuum and temperature. Unlike most other thin film preparation techniques, the deposition conditions for MBE can be far from thermodynamic equilibrium, allowing surface processes to govern transport and reaction kinetics either during or subsequent to the deposition.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jul 01, 1998
- Accession Number
- ADA388422
Entities
People
- D. J. Swenson
- M. Krishnamurthy
- T. J. Schulz
Organizations
- Michigan Technological University