Optical Diagnostics Systems Supplementing Integrated Materials Processing Facility of Major University Research Initiative
Abstract
As part of the DoD-MURI research program entitled 'Modeling and control of Advanced Chemical Vapor Deposition Processes: the Control of Defects in Mixed III-V Compound Semiconductors' (Grant F49620-95-1-0447), DURIP funding was provided to establish a real-time optical characterization facility to study thin-film growth processes extended to super-atmospheric pressures. The extension of the chemical vapor deposition (CVD) to operating conditions at super-atmospheric pressures mandated validation of: (a) Simulations of surface reaction kinetics; (b) Simulations of homogeneous gas phase reactions coupled to transport in laminar high density vapor flows; and (c) the development of experimental methods for the detection of onset of turbulence, that is, verification of laminar flow under conditions of high pressure OMCVD.
Document Details
- Document Type
- Technical Report
- Publication Date
- May 25, 2001
- Accession Number
- ADA391292
Entities
People
- H. Thomas Banks
- K. J. Bachmann
- N. Dietz
Organizations
- North Carolina State University