In Situ Measurement of Growing Thin Films by Energy Dispersive X-Ray Reflectivity: Theory and Experimental Design
Abstract
A method for the in-situ measurement of thin-film growth by x-ray reflectivity is described. Description of the underlying theory is given. Real-time characterization of thickness and roughness variation during growth is possible via this technique. A deposition chamber for the implementation of these measurements has been designed and constructed. This apparatus is described, along with software developed for the purpose of data acquisition and analysis.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jul 01, 2001
- Accession Number
- ADA392891
Entities
People
- Donald Windover
- Jason Summers
- Sabrina Lee
- Toh-ming Lu
Organizations
- United States Army Armament Research, Development and Engineering Center