New Directions in Mask Engineering

Abstract

The scattering of electromagnetic waves from complex objects coated with lossy materials with negative and positive permittivity embedded in a layered medium is analyzed via new formulations, and a new set of algorithms to implement these formulations is introduced. This new technology is applied here to phase shifted photomasks. The results for various wavelengths and mask thicknesses have been considered carefully and are reported here.

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Document Details

Document Type
Technical Report
Publication Date
Jun 15, 2001
Accession Number
ADA394704

Entities

People

  • David Chrin
  • Eytan Barouch
  • Michael T. Yeung
  • Stephen Knodie
  • Steven Orszag

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Algorithms
  • Computational Fluid Dynamics
  • Computational Science
  • Convolution Integrals
  • Dispersion Relations
  • Electric Fields
  • Electromagnetic Fields
  • Electromagnetic Scattering
  • Engineering
  • Far Field
  • Finite Difference Time Domain
  • Fourier Transformation
  • Geometry
  • Magnetic Fields
  • Materials
  • Scattering
  • Thickness

Fields of Study

  • Physics

Readers

  • Electromagnetic Wave Scattering and Antenna Radiation Engineering
  • Nanofabrication and Microfabrication.