Multivariable Control, Simulation, Optimization, and Signal Processing for the Microlithographic Process

Abstract

The objective of this Multidisciplinary University Research Initiative (MURI) program is to apply multivariable control, simulation, optimization and signal processing techniques to the microlithography sequence.

Open PDF

Document Details

Document Type
Technical Report
Publication Date
Jun 01, 2001
Accession Number
ADA395210

Entities

People

  • Thomas Kailath

Organizations

  • Stanford University

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Computational Fluid Dynamics
  • Electrical Engineering
  • Electromagnetic Scattering
  • Fabrication
  • Information Systems
  • Information Theory
  • Integral Equations
  • Integrated Circuits
  • Manufacturing
  • Neural Networks
  • Optimization
  • Photolithography
  • Printing
  • Semiconductor Manufacturing
  • Semiconductors
  • Signal Processing
  • Two Dimensional

Readers

  • Control Systems Engineering.
  • Distributed Systems and Data Platform Development
  • Nanofabrication and Microfabrication.