Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE): Nanofabrication Tool for High Resolution Pattern Transfer

Abstract

High resolution lithography and directional ion etching are increasingly important for the fabrication of nanostructures. As part of this equipment proposal, a reactive ion etching system was purchased from Oxford Instruments for $305,000. The Army Research Office provided $274,000, and Caltech cost share amounted to $31,500. This instrument was connected and etching conditions were optimized for the fabrication of nanostructures in silicon, silicon dioxide and gallium arsenide. In this final progress report, we will present some examples of functional devices which have been defined by using this very capable ion etching system.

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Document Details

Document Type
Technical Report
Publication Date
Oct 15, 2001
Accession Number
ADA395670

Entities

People

  • Axel Scherer

Organizations

  • California Institute of Technology

Tags

DTIC Thesaurus Topics

  • Crystals
  • Etching
  • Fabrication
  • Gallium Arsenides
  • High Resolution
  • Materials
  • Military Research
  • Nanomaterials
  • Nanostructures
  • Optical Waveguides
  • Optomechanics
  • Photonic Crystals
  • Quantum Dots
  • Reactive Ion Etching
  • Silicon
  • Silicon Dioxide
  • Waveguides

Fields of Study

  • Materials science

Readers

  • Nanofabrication and Microfabrication.
  • Systems Analysis and Design

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene