Origins of Beta Tantalum in Sputtered Coatings

Abstract

The source of beta tantalum formation in sputtered coatings has been a subject of controversy going back over thirty years. For every research paper in which the cause is seemingly identified, there are others, which seem to disprove it. It has been very difficult to find a unifying theory that explains the contradictory results found in these papers. The purpose of this report is to compile the vast amount of information gathered from the literature so that connections can be made between the many parameters involved. Some of the most recent work has attempted to relate the energetics (i.e., atom/ion energy) of the plasma to the alpha right arrow beta transition. It has been shown that the energetics of the plasma can relate to the most crucial sputtering parameters. The most significant feature of the use of plasma energy to explain the alpha right arrow beta transition is that it relates the formation of beta-tantalum to a quantifiable measure.

Open PDF

Document Details

Document Type
Technical Report
Publication Date
Nov 01, 2001
Accession Number
ADA396715

Entities

People

  • C. P. Mulligan

Organizations

  • United States Army Armament Research, Development and Engineering Center

Tags

Communities of Interest

  • Energy and Power Technologies
  • Weapons Technologies

DTIC Thesaurus Topics

  • Arrhenius Equation
  • Coatings
  • Crystal Structure
  • Crystals
  • Electronics Industry
  • Energy
  • Films
  • Grain Boundaries
  • High Energy
  • High Pressure
  • Ion Bombardment
  • Materials
  • Military Research
  • Phase
  • Sputtering
  • Tantalum
  • Transitions

Readers

  • Analytical Mechanics
  • Surface Engineering/Surface Coating Technology.
  • Theoretical Analysis.